12/15/2023 0 Comments Sputtering physical vapor deposition![]() ![]() ![]() ![]() Sputtering sources are compatible with vacuum levels from a few mTorr to UHV and come in many shapes and sizes, from small 1" round type R&D cathodes to large planar production cathodes.īecause the plasma is both electrically neutral and highly conductive, there is little voltage drop across it. Initial electrons from the target's surface cause cascade ionization in the chosen process gas and thus, plasma is formed. Features include a choice of simple or double rotation movement for the system throughput, glow discharge with pre-cleaning, and chamber sizes of 1,700, 1,900 or 2,800 mm in diameter.A voltage is applied between the target material (cathode) and the substrate (anode) to be coated with the target material. There are a number of options to select from when it comes to choosing the right industrial metallization equipment. PhotonExport can help you source the right array of features for your specialist needs. Custom configuration options include a variety of chamber sizes, accessories, techniques and processes for the deposition step, and a choice of work holders, load locks and pumping options. Perfect for research and development or pre-production labs and studios.Īdditional systems, offer greater processing capacity and glove box integration and box coaters with ion beam capability. Accommodates substrate holders with domes (simple or planetary motion) or functional single wafer substrates.Available processes include resistance evaporation, electron beam and sputter vaporization methods.This bench-top coating system accommodates large diameter substrates up to 500 mm with a front-loading box chamber.This stainless steel compact coating system offers a complete range of vacuum systems, chamber and modular process accessories.ĭesigned to the stringent specifications of researchers and electron microscopists, this bench-top coating system is the perfect addition to any laboratory or research studio needing coating solutions for objects with substrate diameters of up to 300 mm in size. Denton Vacuum Bench Coater Diameter to 300 mm PVD We offer the following carefully designed bench-top coating systems, all of which are compact and cost-effective solutions for in-house manufacturing. PhotonExport supplies bench-top tools for SEM ( Scanning Electron Microscopy) and TEM ( Transmission Electron Microscopy) sample preparation or R&D applications where a coating system is needed for use on microscopes and other research tools. PhotonExport sources our PVD technology from experienced manufacturers who have more than three decades of success in producing high-quality thin films equipment. Food packaging (using aluminized PET film).Specialist scientific instruments and tools.The PVD process is used in electronics, optics, and in chemical and mechanical use cases where a thin film is required, including: Next, the vaporized substance is deposited on a receiving object as a coating of a thickness ranging from a few atoms (< 10 Å or 0,0001 µm) to 100 µm (the width of a human hair). First, a solid material is made into a vapor through a number of processes such as heating or sputtering. Physical vapor deposition (PVD) is the production of thin films or ‘coatings’ using a variety of methods involving vacuum deposits. ![]()
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